Photoanodic formation of an organic monolayer on a hydrogen-terminated Si(111) surface via Si–C covalent bond using a Grignard reagent and its application for one-step monolayer-patterning

摘要

Alkyl monolayer (octadecyl) was formed on a hydrogen-terminated Si(1 1 1) (H–Si(1 1 1)) electrode via Si–C covalent bond by photoanodic reaction with C18H37MgCl in THF solution. The formation of the organic monolayer was confirmed by attenuated total reflection (ATR) FT-IR spectroscopy. This process was applied to a one-step patterning of an organic monolayer on a H–Si(1 1 1) by illuminating the H–Si(1 1 1) electrode through photomask in a C18H37MgCl/THF solution at positive potential. The formation of the pattern reflecting the shape of the photomask was confirmed by SEM observations.